FCSCST1133Data Engineering Ecosystem

SCST1133 · Topic 01

ASML EUV Lithography

Understand how extreme ultraviolet lithography projects advanced circuit patterns onto a silicon wafer.

01Introduction to Computer and System
Advanced manufacturing

ASML builds lithography systems—not finished chips

An EUV system coordinates a light source, reflective optics, masks, precision stages, vacuum and metrology.

Simplified ASML EUV lithography process
Figure 24. EUV light is guided by mirrors through the pattern and projection system to the wafer.

EUV system elements

ElementFunction
EUV light sourceProduces extreme ultraviolet light at a wavelength of 13.5 nm.
Collector and mirrorsGuide and focus light inside a vacuum environment.
ReticleCarries the circuit pattern for the selected layer.
Projection opticsReduce and project the pattern onto the wafer.
Wafer stagePositions the wafer with extremely high precision.
Metrology and controlMeasure alignment and correct errors throughout exposure.

High-NA EUV

High-NA EUV systems use a numerical aperture of 0.55 to support finer patterning for future advanced logic and memory manufacturing.